Tag search on ‘laser’

Equipment Name Description & Use Department Contact
Nitrogen LaserA gas laser using molecular nitrogen as gain mediumChemistrygemmert@memphis.edu
Dye LaserA laser that uses dye as lasing mediumChemistrygemmert@memphis.edu
Nitrogen LaserA gas laser using molecular nitrogen as gain medium in the ultraviolet rangeChemistrytburkey@memphis.edu
Laser SystemA laser device that emits light through a process of optical amplification based on the stimulated emission of electromagnetic radiationChemistryxhuang4@memphis.edu
Survey Rods/LaserA control tool used in surveying and constructionCivil Engineeringbwaldron@memphis.edu
LBX-488-100-CSB-PP-Laser module,Laser diode moduleElectrical and Computer Engineeringcpreza@memphis.edu
R532001FX-LRS-0532-PFM-00200-Diode-pumped solid-state (DPSS) laser for fluorescence excitationElectrical and Computer Engineeringmblsbrmn@memphis.edu
Quantel BRIO/IR-SB, Wavelength:A fiber laserElectrical and Computer Engineeringstgriffn@memphis.edu
Small Direct Metal Laser Sintering SystemSmall Direct Metal Laser Sintering System (EOS M100) that uses a 200 W Yb (Ytterbium) fiber laser with wavelength 900 – 1200 nm, 40 µm diameter of the laser beam in the building area, and 163 mm focal length of the F-Theta lens (flat plane optic). It operates a dual re-circulating filter system with F9 (pre-filter) and F13 (main filter). The minimum exposure diameter area is 100 mm with an exposure speed up to 7000 mm/s and the scanner position repeatability is < 22 ? rad. The machine can operate under Argon or Nitrogen inert gases and includes all the required software and validated process parameters for printing of bulk Steel 316L and Ti-6Al-4V metal.Mechanical Engineeringeasadi@memphis.edu
Medium Direct Metal Laser Sintering SystemMedium Direct Metal Laser Sintering System (EOS M290) that uses a 400 Watt Yb (Ytterbium) fiber laser with a wavelength of 1060-1100 nm and using an F-Theta focusing lens, the focal length of the F-Theta lens is 410 mm. The machine also contains self-cleaning filters. The minimum exposure area is 250 mm x 250 mm with an exposure speed up to 7000 mm/s and a scanner position repeatability of < 11 ? rad. The z-axis repeatability of positioning is ? ± 0.005 mm. EOS M290 uses am high-speed steel and ceramic blades with travel speed 40-500 mm/s. In addition, the integrated platform has a heating module capable of operating between approx. 40 to 200° C. The EOS M290 machine license includes a full academic license with validated parameters for bulk MS, MP, Ti-6Al-4V, AlSi10Mg, IN625, IN718, HX and 316L.Mechanical Engineeringeasadi@memphis.edu
CHAMELEON ULTRA IIUltrafast pulsed laser (fs) for spectroscopyPhysics and Materials Sciencetbhoang@memphis.edu
Sapphire SF 488-50 CDRH USB Laser SystemCW laser for fluorescence and RamanPhysics and Materials Sciencetbhoang@memphis.edu
Flare NX 515-0.6-2 Air Laser SystemkHz laser for fluorescence and RamanPhysics and Materials Sciencetbhoang@memphis.edu
SHG: Harmonix: 680-1080nm Input Range: 1.3W: ManualSecond Harmonic generation for the Chameleon laserPhysics and Materials Sciencetbhoang@memphis.edu
FieldMaxII-TO and OP-2 VIS systemCoherent power meter to measure laser powerPhysics and Materials Sciencetbhoang@memphis.edu
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