Sputter deposition system. Instrument is located in a class 1000 clean room
Equipment Information
Instrument Name
Sputter deposition system. Instrument is located in a class 1000 clean room
Make
AJA International
Model
Orion 5
Count
1
Description of Use and Application
Vapor deposition method to deposit thin metal films by sputtering from a target source onto a substrate such as a silicon wafer.
Collaboration Plans and Interdisciplinary Engagement for Equipment
Part of shared research facility
UofM Inventory Number
12762100
Weblink
Requirements
Usage Requirements
Contact IMC staff https://www.memphis.edu/imc/contact/in-depth or sign up on line for frequent users
Health and Safety Training Requirements
Training required
Materials
Silicon wafer substrate. Metal target if not available at IMC.
Shareable
Rates
Internal Hourly Rate ($USD)
20.00
External Non-Profit Hourly Rate ($USD)
0.00
External For-Profit Hourly Rate ($USD)
50.00
Service Rate ($USD)
Additional Fee/Rate Description
Location
Campus
Main Campus
Building
Life Sciences Building
Room
111
Contact Information
Department
Biological Sciences
Chair Name
Omar Skalli
Center
Integrated Microscopy Center
Contact Name
Omar Skalli
Contact Phone Number
(901) 494-7342
Contact E-Mail
Department Weblink
General Asset Information
Responsible Group
Research Equipment Asset Managers
Asset ID
RE-000022
Status
OPERATIONAL
Linked Persons
Omar Skalli
Searchable Keywords
deposition, surface, material sciences, metal, sputtering
Searchable Tags
system, materials science, device